초고분해능전계방사주사전자현미경(FESEM 5)
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단축명 | FESEM 5 (EDS/EBSD) |
모델명 | JSM-IT800 |
설치장소 | 미세구조분석실//[81B106]주사전자현미경실 |
제작사 | JEOL |
도입년도/가격 | 202102 / 826,945,095 |
담당자 | 조현진(Jo Hyeonjin) 031-299-6749 |
장비용도 | |
Analysis of phase, chemical elements, crystal structure at small region for materials needing the high resolution 고해상도를 요구하는 재료의 상관찰, 화학조성분석, 결정구조분석 | |
기본사양 | |
1. Resolution - 0.5nm guaranteed at 15kV - 0.7nm guaranteed at 1kV - 0.9nm guaranteed at 500V 2. Magnification - x10 to x2,000,000(Photo mode) 3. Image type - Secondary-electron Image - Backscattered-electron Image 4. Accelerating voltage - 0.01 to 30kV 5. Probe current - A few pA to 500nA 6. Electron Gun - In-lens Schottky field-emission gun 7. EDS(Dual) - Detect from Li to Bi - Silicon Drift Detector - Sensor Size : windowless 100mm2, 170mm2 - 2 sets 8. EBSD - Guaranteed indexing speeds in excess of 4500 pps - Extreme sensitivity, benefiting all types of analysis |